I-Gallium oxide | |
Ifomula yemichiza | iGa2O3 |
Ubunzima beMolar | 187.444 g/mol[1] |
Imbonakalo | umgubo omhlophe wekristale |
Ukuxinana | 6.44 g/cm3, alpha;5.88 g/cm3, beta |
Indawo yokunyibilika | 1,900°C (3,450°F; 2,170K) alpha;1725°C, beta |
Ukunyibilika emanzini | enganyibilikiyo |
Ukunyibilika | Inyibilika kwiiasidi ezininzi |
Umgangatho ophezulu weGallium oxide Specification
Inqaku lenqaku. | Ukuqulunqwa kwemichiza | Ubungakanani beNcam | ||||||||
Ca2O3 | Mat.(Isiphumo soHlolo) PPM | D50 | ||||||||
(wt%) | Ni | Cu | Ca | Fe | Zn | In | Mn | Cr | μm | |
UMGO4N | ≥99.99% | 8.2 | 3.8 | 2.5 | 2.4 | 0.8 | 0.4 | 0.1 | 0.1 | 3.82 |
Ukupakisha: 25kg / ibhotile yeplastiki, 20 ibhotile / ibhokisi.
Isetyenziselwa ntoni iGallium oxide?
I-Gallium oxideisetyenziswa kwiilaser, phosphors, kunye nezixhobo zokukhanya.I-Monoclinic ß-Ga2O3 isetyenziswe kwiinzwa zegesi, i-luminescent phosphors kunye neengubo ze-dielectric kwiiseli zelanga.Njengeoksidi ezinzileyo, ikwanako nokuba nzulu kwe-ultraviolet transparent conductive oxides, kunye nokusetyenziswa kwe-transistor.Iifilim ze-Thin Ga2O3 zinomdla kurhwebo njengezixhobo ezibuthathaka kwigesi.I-ß-Gallium (III) i-oxide isetyenziselwa ukuveliswa kwe-Ga2O3-Al2O3 catalyst.Ikwafumaneka: Iithagethi zeGallium Oxide Sputtering Ga2O3.